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Lower the leftmost component (口) for 啝 (U+555D, CN/HK/TW regions only), and also please look into redesigning the position of the 口 radical for consistency sake #328
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In addition to this, we may need to relook at the position of the 口 component (as the leftmost radical) in general, where in some CN glyphs, it is placed a bit too high compared to the JP glyphs, which I mentioned in #329 that the latter are more well-designed and balanced. As you can see in this image, the green lines represent the more consistent spacing between the leftmost radical 口 and the topmost part of the character in the JP glyphs, and the red lines represent the narrower spacing in some CN glyphs (it also represents the inconsistency of the position of the 口 radical). At the very least some CN/TW/HK glyphs may need to be adjusted to match the balance of JP glyphs, but it's just too many characters to be listed for review. |
But I think the CN versions of the glyphs listed above are better. The 口 compoments in JP ones are too low, and need to adjust to math the CN ones. Although the 口 compoment in 啝 is obviously too high. (BTW I am from China Mainland) |
I feel the leftmost component is too high. Please lower it so that it follows the Serif (CN/HK/TW) reference.
And if possible, we may need to find other characters where 口 (as the leftmost radical) is placed too high for the CN/TW/HK regions and rebalance them.
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