Minor stroke issues in some glyphs (April 2023)

[Marcus98T]

鋙 (U+92D9, JP only) should be adjusted on the extralight master so the strokes don't look like they're touching as circled, when looked at small sizes.

觚 (U+89DA, TW only) should increase the hook length in the 角 radical.

Follow the JP reference:

攜 (U+651C, TW only) should have the right feet on 山 removed, in addition to the 隹 component as mentioned before.

Finally, for 靠 (U+9760), the TW glyph should be removed; TW be remapped to KR, and also please adjust the KR glyph (heavy master only) for better balance, the space between the 牛 and the 口 (that forms 告 at the top) is a bit too much, making it a bit unsightly.

The adjustment should follow as such (just look at the heavy weight at the right):

[Marcus98T]

竄 (U+7AC4, TW only) has a horizontal stroke thickness issue in the ExtraLight master.

The horizontal line in 宀 is too thick (36 units, purple shape in Glyphs) while 儿 is squashed too thin (25 units for the right part, green shape in Glyphs). Please make the thickness of the top 穴 part consistent, roughly around 29-30 units tall as reference (as seen in the last picture, blue shape in Glyphs).

Also you might want to check other characters that have this similar stroke issue in the 宀 component for TW/HK glyphs.

[Marcus98T]

Well regarding 靠 (U+9760) I am mistaken regarding remapping HK to KR, it should be that the HK glyph should be redesigned to be based off the current JP glyph, but make the vertical stroke touch the 口 as annotated (similar to the JIS83 glyph, but without the bottom 非 part having one of the strokes crossing the left curve stroke as circled).

I might create a new post to unify 非 across JP/KR and TW/HK if I find issues with the other characters containing this component.